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ItemsCharacteristics Category Temperature Range'-40~+105ºC'-25~+105ºC Rated Voltage Range10~100V.DC160~450V.DC Capacitance Tolerance±20%(20ºC,120Hz) Lekage Current(MAX)1=3√CV (After 5 minutes application of rated voltage)1=Leakage Current(uA) V=Rated Voltage(V) C=Rated Capacitance Dissipation Factor(MAX)Rated voltage10162535506380100160~400420~450 tanδ0.550.50.450.40.350.30.250.20.150.220ºC,120Hz Impedance Ratio(MAX)Rated voltage(V)10~100160~250315~450Z(-25ºC)/Z(20ºC)338Z(-40ºC)/Z(20ºC)12~~(120Hz) EnduranceAfter applying rated voltage with rated ripple current for 3000hrs at 105ºC,thecapacitors shall meet the following requirements Capacitance Changewithin±20% of the intial valueDissipation FactorNot more than 200% of the specifide valueLeakage CurrentNot more than the specified value
ItemsCharacteristics Category Temperature Range '-25~+105ºC Rated Voltage Range200~400V.DC Capacitance Tolerance±20%(20ºC,120Hz) Lekage Current(MAX)
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Open China International Enterprise Limited As a national high-tech enterprise, Shenzhen Bishida Electronics Co., Ltd was established in February 2004. In addition
Open China International Enterprise Limited As a national high-tech enterprise, Shenzhen Bishida Electronics Co., Ltd was established in February 2004. In addition
Open China International Enterprise Limited As a national high-tech enterprise, Shenzhen Bishida Electronics Co., Ltd was established in February 2004. In addition
Open China International Enterprise Limited As a national high-tech enterprise, Shenzhen Bishida Electronics Co., Ltd was established in February 2004. In addition
Open China International Enterprise Limited As a national high-tech enterprise, Shenzhen Bishida Electronics Co., Ltd was established in February 2004. In addition
Open China International Enterprise Limited As a national high-tech enterprise, Shenzhen Bishida Electronics Co., Ltd was established in February 2004. In addition
Open China International Enterprise Limited As a national high-tech enterprise, Shenzhen Bishida Electronics Co., Ltd was established in February 2004. In addition