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Company:
RAYMOND MANAGEMENT CONSULTANT CO; LTD.

Address:
208.ta-shin rd. lu chu hsiang. tao yuan hsien. taiwan

Phone:
+886-3-3137017

basic Principles of Plasma

A. Principles of Plasma Generation, ,,B. Principles of Collisions,,C. Plasma Potential and Sheath,,D. RF Plasma and Self-bias,,E. Debye Shielding,,F. Plasma Oscillation,,G. Effect of Magnetic Field on Particle motions,,H. Plasma Characterizations,,I. ICP Plasma

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Other goods of this manufacturer :

basic Principles of Plasma
	A. Principles of Plasma Generation, ,,B. Principles of Collisions,,C. Plasma Potential and Sheath,,D. RF Plasma and Self-bias,,E. Debye Shielding,,F. Plasma Oscillation,,G. Effect of Magnetic Field o

conflict management
	O H G [ t T z O H \| F ] P B z A C p H K p H E p

cu process technology
	1.Introduction of Cu/Low-k Interconnects ,,2.Copper Deposition , ,,3.Diffusion Barriers for Cu ,,4.Reliability Issues In Cu Metallization

cu process technology
	1.Introduction of Cu/Low-k Interconnects ,,2.Copper Deposition , ,,3.Diffusion Barriers for Cu ,,4.Reliability Issues In Cu Metallization

cu process technology
	1.Introduction of Cu/Low-k Interconnects ,,2.Copper Deposition , ,,3.Diffusion Barriers for Cu ,,4.Reliability Issues In Cu Metallization

cvd technology
	1.Pinciple of CVD,,2.Metal-CVD,,3.PE-CVD,,4.HDP-CVD,,5.LP-CVD,,6.UHV-CVD

cvd technology
	1.Pinciple of CVD,,2.Metal-CVD,,3.PE-CVD,,4.HDP-CVD,,5.LP-CVD,,6.UHV-CVD

cvd technology
	1.Pinciple of CVD,,2.Metal-CVD,,3.PE-CVD,,4.HDP-CVD,,5.LP-CVD,,6.UHV-CVD

Delegation skills
	v h H ] e G D u @ [ T v u q \| v P v H v O z q j \| H v z C v n B K D \| v H H E v I { Q V W v Q

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